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Main -> Separating systems -> Evaporation -> Plasma generators
Plasma Surface Technology, Femto System, Diener electronic

Plasma surface system
The Femto plasma system was mainly developed for the production of small series, laboratory applications and for research and development purposes.

Plasma technology:
The specimen are first placed on product carriers and then placed in the plasma chamber. After evacuating the chamber, a process gas (e.g. oxygen) is supplied. By means of additionally supplying energy, plasma (ionized gas) is generated. The surface of the specimen is cleaned, activated and - for longer process times - also etched through chemical reactions. The vacuum pump continuously pumps out the process gas. The process can be controlled. Different process gases can be used for a variety of new applications.
Application examples:

  • Creation of highly pure surfaces
  • Photoresist incineration
  • Asbestos analysis
  • Hydrophilic, hydrophobic
  • Adhesive pre-treatment of metals, plastics, elastomers and ceramics
  • Pre-treatment prior to printing, lacquering bonding, adhering...
  • Reduction of oxidized surfaces
  • Solder pre-treatment
  • Sterilisation
  • Etching and texturing of surfaces
  • Electron microscopy
  • TEM-sample holder (REM)

 

Technical data:

Plasma source:

40 kHz (13.56 MHz, 2.45 GHz)

Infinitely variable power:

0 – 200 W

Semi-automatic control

Process timer

1 process gas

Vacuum chamber:

Volume:

2 litres

Material:

stainless steel

Dimensions (Ø × D):

100 × 270 mm

Housing:

Dimensions (W × H × D):

350 × 210 × 500 mm

Weight w/o pump:

18 kg



ArticleOrder No.
Plasma surface technology, type Femto, incl. vacuum pump94 74 10000